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Memorandum of Understanding between ARIPO and EUIPO

The African Regional Intellectual Property Organization (ARIPO) and the European Intellectual Property Office (previously OHIM) signed a Memorandum of Understanding in Geneva on 03rd October, 2016.

Besides developing a competent IP system, the Memorandum shall serve as a tool to increase the bilateral cooperation between the two organizations in the field of intellectual property.

Further, the Memorandum also stipulates that the two organizations shall cooperate in areas like Quality / ISO certification, setting up of IP economic-related studies, such as the EUIPO/EPO study on IP intensive industries and their contribution to economic performance and employment.

This five year agreement, which renews the cooperation between ARIPO and the EUIPO that was first entered into on 08th June 1999 and was further reviewed and extended in 2011, aims to achieve the following:

  • licensing ARIPO data for use in EUIPO’s free to view trade mark and design search platforms, and for statistical information;
  • dedication to a process of harmonization of trade mark and design examination practices,
  • co-operation on training (such as seminars or workshops on the protection of trademarks and designs) with annual meetings of experts in the field of IP to discuss major pending issues;
  • extension of IT, automation and modernization schemes;
  • co-operating on research development and enforcement initiatives; and
  • the exchange of statistical data and information regarding trademarks and designs between the two organizations.

The fruits of the Memorandum are already being enjoyed with the publication of ARIPO’s industrial design data on the EUIPO’s Designview search tool as from 31st October 2016. With the availability of ARIPO’s industrial design data on Designview, the search tool now contains data from 52 offices.

The implementation of the Memorandum will therefore be of much benefit to both ARIPO and EUIPO member states.

Please contact us at Info@cfllegal.com should you require further information.

 

Contributors:

Lorna MbatiaPatricia Muthoni
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